SEM-Based On-Device Overlay Automation for Advanced Lithography Nodes
Master projects/internships - Leuven | About a week ago
Develop image analysis techniques to extract accurate overlay using SEM/EDR data, to enable high-resolution overlay metrology for sub-nm scaling.
As semiconductor technology advances toward sub-nm nodes enabled by high-NA Extreme Ultraviolet (EUV) lithography, precise layer-to-layer overlay control becomes increasingly critical alongside aggressive pitch scaling. For advanced nodes, on-device overlay estimation and validation using high-resolution techniques such as SEM, TEM, and EDR become essential alongside. However, manual inspection and analysis of large image datasets are inefficient and incompatible with high-volume manufacturing requirements.
This Master’s internship project aims to develop an automated, high-resolution SEM image-based overlay metrology approach, combining advanced image processing and algorithm development to enable accurate on-device overlay detection.
The key objectives:
- Image Processing and Analysis: Develop robust image analysis techniques to extract accurate overlay information from SEM/EDR/TEM data.
- Process compatibility: Evaluate reliability across different process conditions and DOEs and explore potential performance improvements.
- Dissemination: Target patents and/or publications, with opportunities to present results at international conferences.
Candidate Profile:
- You hold a Bachelor’s degree or are currently pursuing a Master’s degree in Engineering or Science, preferably in Computer Science, Electrical/Electronic Engineering, Physics, Artificial Intelligence, Machine Learning, or related fields.
- Strong programming skills (e.g., Python, MATLAB, C/C++).
- You have a strong research interest and motivation to develop algorithms for large-scale data analysis and image processing.
- Strong analytical skills to interpret and validate research results.
- Ability to work effectively in multidisciplinary teams, with good communication skills.
- Fluent in English.
Master's degree: Master of Engineering Technology, Master of Engineering Science, Master of Science
Required educational background: Computer Science, Electrotechnics/Electrical Engineering, Physics, Nanoscience & Nanotechnology
Duration: 12 months
University promotor: Stefan De Gendt (Chemistry, Nano)
For more information or application, please contact the supervising scientist Rajendra Kumar Saroj (rajendra.kumar.saroj@imec.be).