Since its creation as an ‘electronics superlab’ in 1984, imec’s infrastructure has been the bedrock of its continued success as the leading global semiconductor R&D center. Today, its three pillars consist of:
In the beginning of this century, imec launched its pioneering 300mm research program. Since then, the cleanroom in Leuven, Belgium, quickly became a key hub of the global semiconductor ecosystem. Here, the processes that enable the future microchip technology nodes are collaboratively developed and perfected. To this end, the 8,000 m² of cleanroom space is filled with the world’s most advanced industry-relevant equipment – from all leading OEMs including many European suppliers – for lithography, implant, cleaning, metrology, deposition, etc.
A particularly noteworthy illustration of imec’s key role in advancing the semiconductor roadmap is its collaboration with ASML towards EUV lithography and more recently High NA EUV lithography. Currently, the joint High NA Lithography Lab in Veldhoven, The Netherlands, is where memory and chip manufacturers get access to the high-NA EUV prototype scanner and surrounding tools to prepare this technology for its introduction into major foundries.
Joint High NA Lab of imec and ASML
Thanks to EU Chips Act funding, imec’s 300mm infrastructure will be now extended with a new cleanroom, and dozens of additional advanced tools for processing and metrology. The efficiency of fab operations will also be elevated to new heights through increased tool automation, more connected instruments with central data storage, and automated stocker connections between the cleanrooms on the campus of imec Leuven.
The goal of the resulting NanoIC pilot line is to further accelerate the innovation needed for enabling future compute systems. This is achieved by speeding up the R&D learning cycles and bringing new technologies to a higher level of maturity.
The NanoIC pilot line will focus on 9 technology enablers towards future hpc systems:
These baseline flows will have a technology readiness level of 3-6, much higher than typical research flows. This platformization and its repeatability, variability and defectivity improvements allows:
At the same time, advanced R&D into exploratory logic, memory and interconnect technologies, that shapes the long-term roadmaps of our partners remains one of the core purposes of our research infrastructure – and will also benefit from the established platforms.
The 5,200 m² of imec’s 200mm cleanroom, of which 1,750 m² is in class 1, is available for development on demand, prototyping, and manufacturing.
Several mature platforms are available, often with a PDK:
Furthermore, a wide range devices that require special process steps, such as custom CMOS imagers and GaN-on-Si devices, can be developed in imec’s 200mm cleanroom. And because of the compatibility of these tools with those in major foundries, the manufacturing process can be transferred to high-volume fabrication.
500m2 of laboratory space is dedicated to imec’s health and life science R&D activities.
The imec campus hosts a fully operational laboratory to conduct basic DNA research.